International Symposium on
Measurement Technology and Intelligent Instruments
28 November - 1 December 2003
Novel Optical Techniques for Nanometer Measurements
Properties of light are classified into three typical phenomena of geometrical optics, wave optics and quantum optics, each of which may be subdivided as follows; (1) Geometrical optics : reflection, refraction, rectilinear propagation,(2) Wave optics : interference, diffraction, polarization, (3) Quantum optics : energy of photon (E=hν). Geometrical optics is easily described in terms of straight lines and plane geometry. Wave optics deals with the wave nature of light. Quantum optics deals with light as made up of tiny bundles of energy called "photon". On the other hand, there are two different fields in optics, one is far field optics, the other is near field optics. In scattering light based on far field optics, the resolution is limited by diffraction of light, which is approximately expressed as l/NA, where l is wavelength of light, NA is numerical aperture of objective. However, in localized wave called "evanescent light" based on near field optics, the resolution is independent of wavelength of light, but depends on the aperture of the probe with a tip such as an optical fiber probe. Since these properties of light can be used as various optical measurement technologies, so far many optical precision measurement techniques have been developed for the detection and the evaluation of form, position, surface and microstructure with nm scale to μm scale. The novel optical measurement techniques mean that enables nano in-process measurement for the microstructures, nano 3-D coordinate measurement (nano-CMM) for the micromachining parts and nano internal defects inspection, such as silicon wafer subsurfaces. This report presents the latest optical precision techniques having a potential for the nanometer measurements developed in our Laboratory, which are inverse scattering phase method for 3D microstructure profile measurement, evanescent light method for nano internal defects detection of silicon wafer subsurface and laser trapping method for nano-3D coordinate measurement of micromachining parts.
T. Miyoshi graduated from Hokkaido University, Department of Precision Engineering in 1967. He worked at Hokkaido University as Research Associate and Associate Professor for about 20 years. In 1991, he got the position of Professor at Osaka University. He received doctor degree from Hokkaido University in 1981 on thesis "Study on the Gross Measurement of Polished Free Form Surface by means of Fiber Optics". His research interest is focused on optical measurement technologies on production engineering, especially laser applied nano-in-process measurement technology. More recently, his field has been expanded in the area of micromachining using fine particles controlled by optical radiation pressure. He published a lot of papers, more than 100. He won the Japan Society for Precision Engineering Award for his papers four times in 1988, 1996, 1999 and 2000, and also The Machine Tool Promotion Foundation Award for his papers twice in 1988 and 1990. The First Prize of The Precision Measurement Technology Promotion Foundation was awarded in 1990. He is funded by Grant-in-Aid for Scientific Research to investigate his research project "Micromaching and measurement with nano scale based on optical radiation pressure". He is the director of Japan Society for Precision Engineering and former President of Kansai Branch of Japan Society for Precision Engineering. He is a member of JSPE, JSME, ASPE, EUSPEN etc.
Number of visits:
09 March 2010